کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5466055 | 1517976 | 2017 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Corrosion behaviour and microstructure of tantalum film on Ti6Al4V substrate by filtered cathodic vacuum arc deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Tantalum (Ta) films of about 100 nm in thickness were fabricated onto Ti6Al4V substrate using a filtered cathodic vacuum arc deposition system with and without a â 100 V bias between the substrate and the chamber wall. The structure of the deposited film at zero substrate bias exhibits pure tetragonal phase (beta-Ta), and body-centred cubic structure (alpha-Ta) is found as the substrate bias increased to â 100 V. The film deposited at â 100 V bias shows a significant improvement in cohesion as compared to the film deposited without substrate bias. Potentiodynamic polarization and electrochemical impedance tests in phosphate buffered saline solution revealed that the Ta film at â 100 V bias shows good corrosion resistance with a low corrosion current density of 0.009 μA·cmâ 2. The film shows hydrophobic characteristics, low surface free energy and an inert surface presenting a uniform oxide layer, which is promising for potential biomedical implant applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 636, 31 August 2017, Pages 54-62
Journal: Thin Solid Films - Volume 636, 31 August 2017, Pages 54-62
نویسندگان
Ay Ching Hee, Yue Zhao, Sina S. Jamali, Philip J. Martin, Avi Bendavid, Hui Peng, Xiawei Cheng,