کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5466055 | 1517976 | 2017 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Corrosion behaviour and microstructure of tantalum film on Ti6Al4V substrate by filtered cathodic vacuum arc deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Corrosion behaviour and microstructure of tantalum film on Ti6Al4V substrate by filtered cathodic vacuum arc deposition Corrosion behaviour and microstructure of tantalum film on Ti6Al4V substrate by filtered cathodic vacuum arc deposition](/preview/png/5466055.png)
چکیده انگلیسی
Tantalum (Ta) films of about 100 nm in thickness were fabricated onto Ti6Al4V substrate using a filtered cathodic vacuum arc deposition system with and without a â 100 V bias between the substrate and the chamber wall. The structure of the deposited film at zero substrate bias exhibits pure tetragonal phase (beta-Ta), and body-centred cubic structure (alpha-Ta) is found as the substrate bias increased to â 100 V. The film deposited at â 100 V bias shows a significant improvement in cohesion as compared to the film deposited without substrate bias. Potentiodynamic polarization and electrochemical impedance tests in phosphate buffered saline solution revealed that the Ta film at â 100 V bias shows good corrosion resistance with a low corrosion current density of 0.009 μA·cmâ 2. The film shows hydrophobic characteristics, low surface free energy and an inert surface presenting a uniform oxide layer, which is promising for potential biomedical implant applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 636, 31 August 2017, Pages 54-62
Journal: Thin Solid Films - Volume 636, 31 August 2017, Pages 54-62
نویسندگان
Ay Ching Hee, Yue Zhao, Sina S. Jamali, Philip J. Martin, Avi Bendavid, Hui Peng, Xiawei Cheng,