Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

- N-TiO2 films were obtained with different nitrogen content in magnetron plasma.
- Preferential rutile formation is due to the nitrogen increase in plasma.
- Structural elements refinement takes place with the nitrogen increase in plasma.
- Modified Structure Zone Model was developed on the basis of nitrogen location.
- Ultraviolet radiation results in weak hydrophilization of the film surface.

N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character.