کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5466559 | 1398905 | 2016 | 33 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Performance improvement of poly-Si tunnel thin-film transistor by NH3 plasma treatment
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
In this paper, low-temperature polycrystalline silicon (poly-Si) tunnel thin-film transistors (tunnel-TFTs) are demonstrated to show excellent short-channel effects immunity due to their special current transport mechanism: inter-band tunneling. The ammonia (NH3) plasma surface treatment before the deposition of gate dielectric can significantly reduce the grain boundary trap state densities (NGB) of poly-Si channel film and the interface trap state densities (Nit) at the gate-oxide/poly-Si interface. About 27% reduction of NGB by NH3 plasma surface treatment can reduce the minimum drain current ~Â 0.51Â Ã and improve the subthreshold slope due to the suppression of trap-assisted tunneling, which dominates the current transport in the subthreshold operation region. In addition, about 37% reduction of Nit by NH3 plasma surface treatment can significantly enhance the on-state current ~Â 2.86Â Ã due to the increase of band bending of poly-Si channel potential, which can decrease the tunneling distance to increase the electron tunneling probability. Consequently, the performance improvement of poly-Si tunnel-TFTs by the NH3 plasma surface treatment would be helpful for the development of system-on-panel and three-dimension integrated circuits.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 618, Part A, 1 November 2016, Pages 178-183
Journal: Thin Solid Films - Volume 618, Part A, 1 November 2016, Pages 178-183
نویسندگان
William Cheng-Yu Ma, Yi-Hsuan Chen, Zheng-Yi Lin, Yao-Sheng Huang, Bo-Siang Huang, Zheng-Da Wu,