کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5758723 | 1317500 | 2017 | 31 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Degradation of natural organic matter by UV/chlorine oxidation: Molecular decomposition, formation of oxidation byproducts and cytotoxicity
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
علوم زمین و سیارات
فرآیندهای سطح زمین
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Degradation of natural organic matter by UV/chlorine oxidation: Molecular decomposition, formation of oxidation byproducts and cytotoxicity Degradation of natural organic matter by UV/chlorine oxidation: Molecular decomposition, formation of oxidation byproducts and cytotoxicity](/preview/png/5758723.png)
چکیده انگلیسی
The degradation of natural organic matters (NOMs) by the combination of UV and chlorine (UV/chlorine) was investigated in this study. UV/chlorine oxidation can effectively degrade NOMs, with the degradation of chromophores (â¼80%) and fluorophores (76.4-80.8%) being more efficient than that of DOC (15.1-18.6%). This effect was attributed to the chromophores and fluorophores (double bonds, aromatic groups and phenolic groups) being preferentially degraded by UV/chlorine oxidation, particularly reactive groups with high electron donating capacity. Radical species
- OH and
- Cl were generated during UV/chlorine oxidation, with the contribution of
- OH 1.4 times as high as that of
- Cl. The degradation kinetics of different molecular weight (MW) fractions suggests that UV/chlorine oxidation degrades high MW fractions into low MW fractions, with the degradation rates of high MW fractions (>3000Â Da) 4.5 times of those of medium MW fractions (1000-3000Â Da). In comparison with chlorination alone, UV/chlorine oxidation did not increase the formation (30Â min) and formation potential (24Â h) of trihalomethanes, but instead promoted the formation and formation potential of haloacetic acids and chloral hydrate. Adsorbable organic halogen (AOX) formed from UV/chlorine oxidation of NOM were 0.8 times higher than those formed from chlorination. Cytotoxicity studies indicated that the cytotoxicity of NOM increased after both chlorination and UV/chlorine oxidation, which may be due to the formation of AOX.
- OH and
- Cl were generated during UV/chlorine oxidation, with the contribution of
- OH 1.4 times as high as that of
- Cl. The degradation kinetics of different molecular weight (MW) fractions suggests that UV/chlorine oxidation degrades high MW fractions into low MW fractions, with the degradation rates of high MW fractions (>3000Â Da) 4.5 times of those of medium MW fractions (1000-3000Â Da). In comparison with chlorination alone, UV/chlorine oxidation did not increase the formation (30Â min) and formation potential (24Â h) of trihalomethanes, but instead promoted the formation and formation potential of haloacetic acids and chloral hydrate. Adsorbable organic halogen (AOX) formed from UV/chlorine oxidation of NOM were 0.8 times higher than those formed from chlorination. Cytotoxicity studies indicated that the cytotoxicity of NOM increased after both chlorination and UV/chlorine oxidation, which may be due to the formation of AOX.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Water Research - Volume 124, 1 November 2017, Pages 251-258
Journal: Water Research - Volume 124, 1 November 2017, Pages 251-258
نویسندگان
Wen-Long Wang, Xue Zhang, Qian-Yuan Wu, Ye Du, Hong-Ying Hu,