کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8032443 | 1517949 | 2018 | 26 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of substrate nitridation on the threading dislocation density of GaN grown on 200â¯mm Si (111) substrate
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
High quality GaN was grown on 200â¯mm Si (111) substrates by using AlN and 3 step-graded AlxGa1-xN as the buffer layer in a metalorganic chemical vapor deposition system. We have investigated the influence of NH3 pre-flow time on the threading dislocation density (TDD) of AlN, AlGaN buffer layers and GaN layers. It was observed that the compressive stress introduced into the buffer layer and GaN is dependent on the nitridation time. The lowest TDD for GaN obtained in our samples was ~1â¯Ãâ¯109â¯cmâ2 for screw type and 3.2â¯Ãâ¯109 cmâ2 for edge type dislocations, as obtained from atomic force microscopy and further confirmed by high resolution X-ray diffraction analysis. The threading dislocations generated in the first buffer layer (AlN) during its nucleation are found to influence the TDD in the subsequent layers. Samples without an intentional nitridation step exhibit higher TDD compared to the samples with optimal nitridation time. Longer nitridation time also leads to poor crystalline quality likely because of amorphous SiNx formation at the interface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 663, 1 October 2018, Pages 73-78
Journal: Thin Solid Films - Volume 663, 1 October 2018, Pages 73-78
نویسندگان
Abdul Kadir, Saurabh Srivastava, Zhang Li, Kenneth Eng Kian Lee, Wardhana A. Sasangka, Silvija Gradecak, Soo Jin Chua, Eugene A. Fitzgerald,