کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8032676 1517958 2018 38 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Deposition time dependence of the morphology and properties of tin-catalyzed silicon oxide nanowires synthesized by the gas-jet electron beam plasma chemical vapor deposition method
ترجمه فارسی عنوان
وابستگی زمان رسوب گذاری مورفولوژی و خواص نانوسیم های اکسید سیلیکون کاتالیزور شده با قلع سنتز شده توسط روش پلاسما شیمیایی تهیه پودر شیمیایی پلاسما الکترون جت الکترونی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
SiOx nanowires (SiOxNWs, x ≤ 2) were grown by gas-jet electron beam plasma chemical vapor deposition method according to the vapor-liquid-solid mechanism at different synthesis times (tdep = 0.5-5 min) using tin particles as a catalyst. Microropes of SiOxNWs were obtained at tdep of more than 1 min. The average growth rate of nanowires was about 19 nm/s. Fourier transform infrared (FTIR) spectroscopy shows that SiOxNWs synthesized at different tdep are very similar in chemical composition (x ≈ 2) and in the bonding network of SiOx. FTIR spectroscopy data on the chemical composition of nanowires are in good agreement with the results of X-ray energy dispersive spectroscopy (EDS) analysis. EDS mapping of silicon and oxygen indicates that the atoms are uniformly distributed in the nanowires. Also, FTIR measurements showed that a significant number of water-adsorbing silanol groups formed on the surface of the nanowires. Photoluminescence spectra of nanowires obtained at different tdep are typical of SiO2 and exhibit a broad band in the region 400-600 nm centered at ~475 nm. The contact angle for SiOxNWs is <21° and decreases to 4.4° with increasing tdep, indicating a superhydrophilic coating.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 654, 31 May 2018, Pages 61-68
نویسندگان
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