کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8032889 1517963 2018 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Optical emission spectroscopy as a process-monitoring tool in plasma enhanced chemical vapor deposition of amorphous carbon coatings - multivariate statistical modelling
ترجمه فارسی عنوان
طیف سنجی انتشار نوری به عنوان یک ابزار نظارت بر فرایند در پلاسما بهبود بخارات بخار شیمیایی پوشش های غیر کربن - مدل سازی آماری چند متغیره
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Production of Diamond-Like Carbon (DLC) nanocoatings using plasma enhanced chemical vapor deposition is studied by Optical Emission Spectroscopy (OES) as a plasma diagnostic technique. The objective of the current research is to establish a predictive model of DLC properties using a multivariate analysis method. This model is based on OES data instead of process parameters, which are reactor dependent and accordingly, their effect on the plasma deposition process may vary from one reactor to another. The predictive potential of OES is evaluated using partial least square regression (PLSR) analysis. The results show that OES derived data are capable of replacing some process parameters to predict the DLC properties. The perspective of PLSR modelling and OES application for the development and monitoring of a structurally graded DLC coating is also discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 649, 1 March 2018, Pages 106-114
نویسندگان
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