کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8033040 | 1517965 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of replica cliché with fine pattern using reverse offset printing process
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Among the printing processes for printed electronic devices, the gravure offset and reverse offset methods have drawn attention for their fine pattern printing potential. These printing methods use a cliché, which has a decisive effect on the precision and quality of the final product. In this research, a precise cliché replica method is proposed. It consists of copper (Cu) sputtering, precise reverse offset printing with a 5-μm pattern width, nickelâcobalt (Ni-Co) electroplating, rinsing, etching, and diamond-like carbon (DLC) coating. Cu is deposited on glass by sputtering to a thickness of 3 μm. Ni-Co is electroplated to a thickness of 300 nm only on the copper and not on the printed pattern. After removing the printed pattern during the rinsing process, Cu is etched through the revealed part resulting from the rinsing process. For the last step of the process, DLC coating is conducted to protect the surface. We finally compare the fabricated replica cliché with the original and print out precise patterns using the replica cliché.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 647, 1 February 2018, Pages 57-63
Journal: Thin Solid Films - Volume 647, 1 February 2018, Pages 57-63
نویسندگان
Yejin Shin, Inyoung Kim, Dongho Oh, Taik-Min Lee,