Electrodeposition of an ultrathin TiO2 coating using a deep eutectic solvent based on choline chloride

An alternative route is proposed for direct electrodeposition of TiO2 films. The electrochemical behaviour of Ti(IV) species in the deep eutectic solvent formed between choline chloride (ChCl) and ethylene glycol (EG) was studied by chronoamperometry and cyclic voltammetry. It was discussed that during the cathodic scan soluble subvalent TiClχ species were formed using the eutectic system 1ChCl:2EG. Using ethylenediamine or LiF as additives it was possible to obtain a titanium dioxide thin film in the orthorhombic variant named brookite. Chronoamperometric investigations revealed a nucleation mechanism involving the simultaneous presence of 2D instantaneous nucleation process including lattice incorporation and a 3D diffusion-limited nucleation and growth process.