کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8033575 | 1517994 | 2016 | 28 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Study of magnetization relaxation in Co thin films prepared by substrate rotation
ترجمه فارسی عنوان
مطالعات آرام سازی مغناطش در فیلم های نازک تهیه شده توسط چرخش سوبسترا
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کلمات کلیدی
فیلمهای نازک مغناطیسی، آرامش مغناطیسی، زمینه انحصاری، دامنه مغناطیسی،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Magnetization relaxation and surface morphology have been studied for Co thin films prepared by sputtering with oblique deposition and by varying the substrate rotation (Ï) at 0, 10 and 20Â rpm. The films prepared with ÏÂ =Â 10 and 20Â rpm during deposition exhibit high dispersion of local grain anisotropy. The average grain size for the samples prepared with ÏÂ =Â 10, 20Â rpm is smaller than that of the sample prepared with ÏÂ =Â 0Â rpm. Uniform distribution of grains is observed for the sample prepared with ÏÂ =Â 10Â rpm. However, the sample prepared with ÏÂ =Â 20Â rpm revealed the formation of non-uniformly distributed island like structures due to the lack of sufficient time for the adatoms to relax. Magnetization relaxation for all the samples was performed using magneto-optic Kerr effect (MOKE) based microscopy in the longitudinal mode. Sample prepared with ÏÂ =Â 0Â rpm exhibits slow relaxation due to nucleation followed by fast domain wall motion. On the contrary, for the sample prepared with ÏÂ =Â 10Â rpm, uniform grains and high exchange interaction leads to fast relaxation. However, the relaxation is slow in the sample prepared with ÏÂ =Â 20Â rpm due to decrease in exchange energy arising from non-uniformity of grains.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 616, 1 October 2016, Pages 328-334
Journal: Thin Solid Films - Volume 616, 1 October 2016, Pages 328-334
نویسندگان
Niru Chowdhury, Sougata Mallick, Srijani Mallik, Subhankar Bedanta,