کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8034045 1518020 2015 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Spray pyrolysis deposition of Cu3BiS3 thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Spray pyrolysis deposition of Cu3BiS3 thin films
چکیده انگلیسی
Wittichenite Cu3BiS3 semiconductor thin films were deposited on glass slides within a range in substrate temperature from 250 °C to 400 °C via spray pyrolysis approach. Effects of substrate temperature on crystal structure, surface morphology, and optical property of Cu3BiS3 films were investigated in details. Pictures from a scanning electron microscope revealed that the as-prepared films in polycrystalline nature were uniform and comprised of close-packed fine nanoparticles, which grew up greatly by increasing substrate temperature to 350 °C. The as-prepared Cu3BiS3 film exhibited a direct optical band gap between 1.65 eV and 1.72 eV.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 585, 30 June 2015, Pages 72-75
نویسندگان
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