کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8035263 1518048 2014 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Characteristics of carbon films prepared by thermal chemical vapor deposition using camphor
ترجمه فارسی عنوان
ویژگی های فیلم های کربن تهیه شده توسط رسوب بخار شیمیایی حرارتی با استفاده از کافور
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
The properties of carbon films prepared by thermal chemical vapor deposition (thermal CVD) using camphor are investigated. As the deposition temperature increases from 1098 to 1198 K, the deposition rate follows the Arrhenius law with activation energy of 59.8 kJ/mol. The possible reaction paths and intermediate species of this thermal CVD process are also considered. The product gases CH3, CH4, and C2H2 can be speculated as the main species for pyrolytic carbon deposition. The crystallinity and ordering degree of carbon films decrease with increasing the deposition temperature. Nevertheless, the sp2 carbon sites increase with increasing the deposition temperature, and results in the decrease of electrical resistivity and the increase of water contact angle. When the camphor weight changes from 0.06 to 0.50 g, the CVD reaction is controlled by a process of half order. Moreover, as the camphor weight increases from 0.30 to 0.50 g, the surfaces of carbon films are partially covered with spherical particles, the water contact angle substantially increases. Finally, the results of this work are compared to those of using CH4 and C2H2 as the precursor gases.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 556, 1 April 2014, Pages 544-551
نویسندگان
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