کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8035352 1518054 2014 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
The deposition of low temperature sputtered In2O3 films using pulsed d.c magnetron sputtering from a powder target
چکیده انگلیسی
Transparent conductive oxide layers are widely used in various applications such as solar cells, touch screen displays, heatable glasses, etc. This present work describes the deposition of transparent and conducting In2O3 films from In2O3 powdered targets using a pulsed d.c magnetron sputtering technique without additional substrate heating or substrate biasing. The films deposited at various oxygen concentrations were approximately 500 nm thick, were pin-hole free and well adhered to the glass substrates. The material characteristics of the films were analysed using X-ray diffraction, four point probe, hot probe, UV-vis spectroscopy, atomic force microscopy and profilometry. Structural and electrical analyses revealed that the films were crystalline and highly conductive when sputtered in the absence of oxygen but a dramatic change in resistivity was observed when oxygen was introduced during the deposition. Resistivity increased from 0.004 Ω cm (no oxygen) to 5 Ω cm with 10% oxygen.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 550, 1 January 2014, Pages 140-144
نویسندگان
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