کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8035890 | 1518059 | 2013 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural, electrical, and thermoelectric properties of CrSi2 thin films
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Structural, electrical, and thermoelectric properties of CrSi2 thin films Structural, electrical, and thermoelectric properties of CrSi2 thin films](/preview/png/8035890.png)
چکیده انگلیسی
Chromium silicide (CrSi2) thermoelectric thin films with two different thicknesses, 1 μm and 0.1 μm, were deposited using radio frequency magnetron sputtering on glass substrates. These films were characterized after deposition and then after 300-600 °C anneals using X-ray diffraction and Energy dispersive X-ray spectroscopy. The Seebeck coefficient and electrical resistivity were measured. The compositions of the sputtered films were found to be close to the sputtering target stoichiometry. The annealing conditions and variations of thickness had a great influence on the thermoelectric performance of the films. The 0.1 μm p-type films annealed in an argon atmosphere at 400 °C exhibited the largest power factor of 1.0 Ã 10â 3 W/(K2·m).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 545, 31 October 2013, Pages 100-105
Journal: Thin Solid Films - Volume 545, 31 October 2013, Pages 100-105
نویسندگان
Makram Abd El Qader, Rama Venkat, Ravhi Kumar, Thomas Hartmann, Paolo Ginobbi, Nathan Newman, Rakesh Singh,