Atomic layer deposition of TiO2 from tetrakis(dimethylamino)titanium and H2O

The variations of the deposition rate are related to a change from a surface determined decomposition of TDMAT to a gas phase decomposition route above 250 °C. At the same temperature, the microstructure of the TiO2 layers changes from amorphous to predominately crystalline, where both anatase and rutile are present.