کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8036466 | 1518062 | 2013 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of solvents on deposition mechanism of Al-doped ZnO films synthesized by cold wall aerosol-assisted chemical vapor deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Influence of solvents on deposition mechanism of Al-doped ZnO films synthesized by cold wall aerosol-assisted chemical vapor deposition Influence of solvents on deposition mechanism of Al-doped ZnO films synthesized by cold wall aerosol-assisted chemical vapor deposition](/preview/png/8036466.png)
چکیده انگلیسی
Using methanol, ethanol, 2-methoxyethanol and isopropanol as solvents in the precursor solutions, respectively, Al-doped ZnO films were synthesized on glass substrates by cold wall aerosol-assisted chemical vapor deposition. The deposition mechanism and the influence of solvents on deposition were discussed, finding that the degree of (0 0 2) orientation growth of the film was significantly influenced by the viscosity of precursor solutions. The deposition velocity decreased as the viscosity of precursor solution increased. Grains tended to uniformly distributed over the substrates for the samples deposited from high-viscosity solutions, while low-viscosity solutions resulted in grain agglomeration. Some droplets generated from 2-methoxyethanol system coagulated due to the greater surface tension. Grains that differ significantly in size were deposited on the film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 542, 2 September 2013, Pages 144-149
Journal: Thin Solid Films - Volume 542, 2 September 2013, Pages 144-149
نویسندگان
Xiu Juan Qin, Lin Zhao, Guang Jie Shao, Na Wang,