All hot wire chemical vapor deposition low substrate temperature transparent thin film moisture barrier

► A multilayer gas barrier was made by hot wire chemical vapor deposition at 100 °C. ► A water vapor transmission rate of 5 × 10− 6 g/m2/day was found. ► Found at 60 °C and a relative humidity of 90%, this is low enough for any device. ► These layers can be deposited directly onto organic of polymeric active devices. ► The adhesion between the organic and inorganic layers, and robustness is high.