Fabrication of ridge waveguide structure from photosensitive TiO2/ormosil hybrid films by using an ultraviolet soft imprint technique

► Photosensitive TiO2/ormosil hybrid film is prepared by a sol-gel process. ► Optical properties of the films change a little with UV exposure time. ► Photo-chemical property of the film changes a lot with UV exposure time. ► The imprint force and time, and the UV exposure time affect the imprint fidelity. ► A fidelity value of 99.7% is obtained under an optimized condition.