Sputter-deposited low loss Mg2SiO4 thin films for multilayer hybrids

► A report on rf magnetron sputtering of low loss α-Mg2SiO4 thin films ► Sensitivity of working pressure; producing α-Mg2SiO4 only at low pressures ► Crystallization of randomly-oriented α-Mg2SiO4 above 500 °C with distinct grains ► Obtaining very low dielectric loss of < 0.3% with the least frequency dependency ► Demonstrating an example of multilayer thin film hybrids with α-Mg2SiO4