کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812063 | 1518106 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Preparation and characterization of sputtered Fe1âxNx films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
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چکیده انگلیسی
Iron nitride films have been prepared by reactive DC magnetron sputtering. The composition of Fe1âxNx was varied over a range of 0 â¤Â x â¤Â 0.5 by controlling the nitrogen flow rate during sputtering. These films were characterized using powder X-ray diffraction (XRD), thermogravimetric and electron microprobe analysis. We found that the nitrogen content in the films increased with nitrogen gas partial pressure. XRD experiments revealed an evolution through the α-Fe, γâ²-Fe4N, É-Fe2 + zN, ζ-Fe2N, γâ´-FeN and γʺ-FeN phases, when the nitrogen gas mole percentage was increased from 0% up to 70%. Above 70%, only the γʺ-FeN phase was formed despite a measurable increase in the nitrogen content of the film with nitrogen gas partial pressure. Rietveld analysis of powder X-ray diffraction patterns revealed that this behavior is due to an increase in the nitrogen site occupation factor within the lattice.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 493, Issues 1â2, 22 December 2005, Pages 60-66
Journal: Thin Solid Films - Volume 493, Issues 1â2, 22 December 2005, Pages 60-66
نویسندگان
E. Bradley Easton, Th. Buhrmester, J.R. Dahn,