کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812145 | 1518107 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Variation of surface properties of ZnO films by the implantation of N+ ions
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Variation of surface properties of ZnO films by the implantation of N+ ions Variation of surface properties of ZnO films by the implantation of N+ ions](/preview/png/9812145.png)
چکیده انگلیسی
In this paper, we studied the variation of surface properties of N+ ions-implanted ZnO films. The ZnO films deposited on K9 glass substrate by direct current reactive magnetron sputtering were firstly implanted with N+ ions and subsequently subjected to process by rapid thermal annealing (RTA) in N2 ambience. The crystallographic properties and surface morphology were examined by X-ray diffraction and atomic force microscopy, respectively. The implantation of N+ ions and RTA not only roughens the surface of ZnO films but also changes the conduction type from the n-type to weak p-type. The resistivity of ZnO films was measured by the four-point probe method and the variation of the conduction type was observed by cool-hot probe point. The resistivity of ZnO films subjected to RTA at 500â¼600 °C decreased about 6-9 orders of magnitude. The optical properties have no significant change.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 492, Issues 1â2, 1 December 2005, Pages 236-239
Journal: Thin Solid Films - Volume 492, Issues 1â2, 1 December 2005, Pages 236-239
نویسندگان
Haiyan Wang, Xiaoyong Gao, Qiliang Duan, Jingxiao Lu,