کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9812301 1518111 2005 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of titanium nitride barrier layer in nickel-titanium shape memory alloys by nitrogen plasma immersion ion implantation for better corrosion resistance
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Formation of titanium nitride barrier layer in nickel-titanium shape memory alloys by nitrogen plasma immersion ion implantation for better corrosion resistance
چکیده انگلیسی
Nickel-titanium shape memory alloys (NiTi) are potentially useful in orthopedic implants due to their super-elasticity and shape memory properties. However, the materials are vulnerable to surface corrosion and the most serious issue is out-diffusion of toxic Ni ions from the substrate into body tissues and fluids. In this paper, we describe our fabrication of TiN barrier layers in NiTi by nitrogen plasma immersion ion implantation followed with vacuum annealing at 450 °C or 600 °C. Our results show that the barrier layer is not only mechanically stronger than the NiTi substrate, but also is effective in impeding the out-diffusion of Ni from the substrate. Among the samples, the 450 °C-annealed TiN barrier layer possesses the highest mechanical strength and best Ni out-diffusion impeding ability. The enhancement can be attributed to the consolidation of the Ti-N layer resulting from optimal diffusion at 450 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 488, Issues 1–2, 22 September 2005, Pages 20-25
نویسندگان
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