کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812558 | 1518115 | 2005 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth of Cr-doped TiO2 films in the rutile and anatase structures by oxygen plasma assisted molecular beam epitaxy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
As part of a search for new spintronic materials, highly ordered films of CrxTi1âxO2 in both the rutile and anatase structures and for several Cr concentrations ranging from x = 0.02 to 0.16 were grown by oxygen plasma assisted molecular beam epitaxy. X-ray photoelectron diffraction data of the Cr 2p level exhibit the same patterns and the same modulation amplitudes as those observed for Ti 2p, providing a strong indication that a large fraction of the Cr atoms occupy substitutional lattice sites in both structures. The Cr 2p core-level spectra as well as a Cr 3d related dopant signal above the valence band of TiO2 are characteristic of Cr3+ ions. At room temperature, Cr-doped anatase films exhibit ferromagnetic order with a saturation magnetization of â¼0.6 μB per Cr atom and strong in-plane anisotropy.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 484, Issues 1â2, 22 July 2005, Pages 289-298
Journal: Thin Solid Films - Volume 484, Issues 1â2, 22 July 2005, Pages 289-298
نویسندگان
J. Osterwalder, T. Droubay, T. Kaspar, J. Williams, C.M. Wang, S.A. Chambers,