کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812600 | 1518116 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth of α-Fe films on n-Si(111) substrate by pulsed electrodeposition in a non-aqueous solution
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Fe thin films were grown directly on n-Si(111) substrates without any buffer layer by pulsed electrodeposition in a 0.1 M FeCl2+methanol electrolyte solution. Over the potential ranges from 1.0 V to 1.4 V, the formation of Fe nuclei in the early deposition stages proceeds through a three dimensional (3D) of instantaneous nucleation mode rather than a progressive one. According to this nucleation mode, the estimated nucleus density (N0) and the diffusion coefficient (D) are of orders of â¼1010 cmâ2 and â¼10â9 cm2 sâ1, respectively. From the as-deposited sample obtained using the potential pulse of 1.4 V and 300 Hz, it is found that Fe nuclei grows to 3D islands with the average size of about 100 nm in early deposition stages. For a longer deposition time, the sizes of Fe nuclei increases progressively and by a coalescence of the nuclei a continuous Fe films grows on the Si surface. In this case, the Fe films show a highly oriented columnar structure and X-ray diffraction (XRD) pattern reveal that the phase α-Fe grows on the n-Si(111) substrates.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 483, Issues 1â2, 1 July 2005, Pages 74-78
Journal: Thin Solid Films - Volume 483, Issues 1â2, 1 July 2005, Pages 74-78
نویسندگان
K.H. Kim, J.D. Lee, J.J. Lee, B.Y. Ahn, H.S. Kim, Y.W. Shin,