کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812742 | 1518119 | 2005 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The structure and stability of β-Ta thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Ta films with tetragonal crystalline structure (β-phase), deposited by magnetron sputtering on different substrates (steel, silicon, and silicon dioxide), have been studied. In all cases, very highly preferred (001) orientation was observed in X-ray diffraction measurements. All diffraction data revealed two weak reflections corresponding to d-spacing of 0.5272 and 0.1777 nm. The presence of the two peaks, attributed to (001) and (003) reflections, indicates that β-Ta films exhibit a high preference for the space group of P-421m over P42/mnm, previously proposed for β-Ta. Differences in relative intensities of (00l) reflections, calculated for single crystal β-Ta Ï-type Frank-Kasper structure and those measured in the films, are attributed to defects in the films. Molecular dynamics simulations performed on tantalum clusters with six different initial configurations using the embedded-atom-method potential revealed the stability of β-Ta, which might explain its growth on many substrates under various deposition conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 479, Issues 1â2, 23 May 2005, Pages 166-173
Journal: Thin Solid Films - Volume 479, Issues 1â2, 23 May 2005, Pages 166-173
نویسندگان
Aiqin Jiang, Trevor A. Tyson, Lisa Axe, Leszek Gladczuk, Marek Sosnowski, Paul Cote,