کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812763 | 1518119 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
V-defects and dislocations in InGaN/GaN heterostructures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
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چکیده انگلیسی
In the growth of InGaN/GaN multi-quantum well (MQW) heterostructures by metal organic chemical vapor deposition, V-defects attached to threading dislocations have been observed and investigated. Energy-dispersive X-ray analysis and conventional transmission electron microscopy studies were carried out in order to determine the In composition and investigate the behavior of the dislocations. The V-defects are limited by {101¯1} lattice planes, they are attached to threading dislocations and may start at the third quantum well. The associated dislocation runs up into the overgrown GaN layer. Some (a+c) dislocations were shown to decompose inside the multi-quantum well, giving rise to a misfit segment in the c-plane and a V-shape defect.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 479, Issues 1â2, 23 May 2005, Pages 316-320
Journal: Thin Solid Films - Volume 479, Issues 1â2, 23 May 2005, Pages 316-320
نویسندگان
A.M. Sánchez, M. Gass, A.J. Papworth, P.J. Goodhew, P. Singh, P. Ruterana, H.K. Cho, R.J. Choi, H.J. Lee,