کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812884 | 1518122 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Self-organized lamellar structured tantalum-nitride by UHV unbalanced-magnetron sputtering
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Self-organized lamellar structured tantalum-nitride by UHV unbalanced-magnetron sputtering Self-organized lamellar structured tantalum-nitride by UHV unbalanced-magnetron sputtering](/preview/png/9812884.png)
چکیده انگلیسی
The structure of the TaNx film transformed from B1-NaCl δ-TaNx to lamellar structured B1-NaCl δ-TaNx+ hexagonal É-TaNx or B1-NaCl δ-TaNx+hexagonal γ-TaNx with increasing ion energy at the same nitrogen fraction fN2. The hardness of the films also increased by the structural change. At the nitrogen fraction of 0.1-0.125, the structure of the TaNx films was changed from δ-TaNx+É-TaNx to δ-TaNx+γ-TaNx with increasing ion energy. However, at the nitrogen fraction of 0.15, the film structure did not change from δ-TaNx+É-TaNx over the whole range of the applied ion energy. The hardness increased significantly from 21.1 to 45.5 GPa with increasing ion energy.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 45-48
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 45-48
نویسندگان
G.R. Lee, J.J. Lee, C.S. Shin, I. Petrov, J.E. Greene,