Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering

Carbon nitride (CNx) film is a material that may successfully compete with DLC coatings, which have high hardness, high wear resistance and a low friction coefficient. Carbon nitride film was prepared on silicon substrate by Close Field UnBalanced Magnetron (CFUBM) sputtering with a graphite target and using nitrogen-argon mixture gas. Parameters were obtained on the deposition rate and investigated effect of total working pressure. The characteristic of the carbon nitride films was analyzed by Raman spectroscopy, energy dispersive X-ray (EDX) analysis, and atomic force microscopy (AFM). The tribological properties are also investigated by hardness measurement.