کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812937 | 1518122 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of SiC micro-lens by plasma etching
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
SiC micro-lenses were fabricated by a plasma etching method by controlling the etch selectivities between photoresist and SiC. To etch SiC, inductively coupled plasmas were used with CF4, HCl, and HCl/HBr as the etch gases. When CF4 and HCl were used to etch SiC, the etch selectivities of SiC over photoresist were remained near 0.4 and 0.6, respectively. However, by using HCl/HBr, the selectivity was changed from 0.6 to 1.1. The SiC etch rates for HCl/HBr were in the range from 345 to 500 nm/min. The curvature radius of SiC micro-lenses fabricated with HCl/HBr was in the range from 20 to 27.54 μm and the roughness of the fabricated lenses was in the range from 1.7 to 2.65 nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 318-322
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 318-322
نویسندگان
H.Y. Lee, D.W. Kim, Y.J. Sung, G.Y. Yeom,