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Daneshyari Instrumentation Journas Latest Articles

Instrumentation Research Articles

Fe K-edge XANES of Maya blue pigment
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A fully integrated multi-channel detector for electron spectroscopy
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High resolution near-surface stress determination using synchrotron X-rays
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High-resolution strain mapping in bulk samples using full-profile analysis of energy dispersive synchrotron X-ray diffraction data
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Automatic X-ray crystallographic phasing at LNLS
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Study of crystalline structures via physical determination of triplet phase invariants
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Phase separation during silica gel formation followed by time-resolved SAXS
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Structure and electron-ion correlation of liquid germanium
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An anomalous X-ray scattering study on glassy superionic conductor (As2Se3)1−x(CuI)x using a third-generation synchrotron radiation facility
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High energy X-ray diffraction analysis of strain and residual stress in silicon nitride ceramic diffusion bonds
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Time-resolved monitoring of cement hydration: Influence of cellulose ethers on hydration kinetics
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High-resolution synchrotron powder diffraction analysis of ordinary Portland cements: Phase coexistence of alite
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Identifying low and high density amorphous phases during zeolite amorphisation using small and wide angle X-ray scattering
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The materials science beamline at the Swiss Light Source
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Structural studies of single wood cell walls by synchrotron X-ray microdiffraction and polarised light microscopy
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Contents
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Radiocarbon dating of iron artefacts at the Erlangen AMS-facility
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New results for single stage low energy carbon AMS
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Radiocarbon dilution effects induced by industrial settlements in southern Italy
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RBS and ERD characterization of SiON films for optical waveguide applications
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Simultaneous depth profiling of the 12C and 13C elements in different samples using (d,p) reactions
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Study of the Pd-Rh interdiffusion by three complementary analytical techniques: PIXE, RBS and ToF-SIMS
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Stability of erbium and silver implanted in silica-titania sol-gel films
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NRBS, RBS, TEM and SAED characterisation of sol-gel PZT films
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RBS characterization of the deposition of very thin SiGe/SiO2 multilayers by LPCVD
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Nondestructive evaluation of as-implanted and annealed ultra shallow junctions by photothermal and photoluminescence heterodyne techniques
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Enhanced thermal and morphological stability of Ni(Si1−xGex) growth on BF2+-preamorphized Si0.8Ge0.2 substrate
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The effects of energy non-monochromaticity of 11B ion beams on 11B diffusion
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Transient enhanced diffusion and deactivation of ion-implanted As in strained Si
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Advanced 65 nm CMOS devices fabricated using ultra-low energy plasma doping
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Ultra shallow junction formation and dopant activation study of Ga implanted Si
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Implantation induced electrical isolation of sulphur doped GaNxAs1−x layers
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Comparison of elemental boron and boron halide implants into silicon
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Diffusion of indium implanted in silicon: The effect of the pre-amorphisation treatment and of the presence of carbon
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Formation of β-FeSi2 by implanting multicharged iron ions produced in an ECR ion source
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Dopant profiling of ultra shallow As implanted in Si with and without spike annealing using medium energy ion scattering
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90 nm device validation of the use of a single-wafer, high-current implanter for high tilt halo implants
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New method of Plasma doping with in-situ Helium pre-amorphization
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Ion beam analysis of CdTe nuclear detector contact grown by electroless process
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Ultra-shallow junction formation by B18H22 ion implantation
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Ion implantation in advanced planar and vertical devices
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Contents
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Subject index
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Calendar
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Invited review: Some challenging unsolved problems in atomic collisions in solids
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Effect of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering
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Soft X-ray absorption at the O K-edge in rutile-type natural oxides
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Disorder in Au and Cu nanocrystals formed by ion implantation into thin SiO2
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Strain effect on the tilt angle in manganite thin films
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Direct observation of ordered orbital of YTiO3 by the X-ray magnetic diffraction technique
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Phase-based cell imaging techniques for microbeam irradiations
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Characterisation of an indirectly heated cathode source using Langmuir probe diagnostics
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RETRACTED: Reproducibility study of (TLD-100) dosimeters using an automated and manual TLD reader for radiotherapy applications
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Surface modification of Natural Rubber by ion implantation: Evidence for implant doping
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Material dependence of total electron emission yields following slow highly charged ion impact
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High resolution backscattering studies of nanostructured magnetic and semiconducting materials
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Nanoscale studies of cement chemistry with 15N resonance reaction analysis
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Improvement in the low energy collection efficiency of Si(Li) X-ray detectors
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ERDA with 15 MeV 4He ions under atmospheric pressure
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Using the LANSCE irradiation facility to predict the number of fatal soft errors in one of the world's fastest supercomputers
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The Berkeley Accelerator Space Effects (BASE) Facility - A new mission for the 88-Inch Cyclotron at LBNL
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High energy focused ion beam lithography using P-beam writing
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A microbeam irradiator without an accelerator
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A versatile control system for irradiation and measurement for secondary beam experiments in a heavy ion accelerator, HIMAC
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Upgrading a Duoplasmatron ion source to produce high brightness beam for nuclear microprobe applications with a tandem accelerator
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Ion backscattering study of ultra-thin oxides: Al2O3 and AlHfOx films on Si
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Accumulation and recovery of disorder in Au2+-irradiated Cd2Nb2O7
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Laser post-ionization secondary neutral mass spectrometry for ultra-trace analysis of samples from space return missions
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Distribution of heavy metals in plants cultivated with wastewater irrigated soils during different periods of time
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Field emitter arrays and displays produced by ion tracking lithography
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Damage annealing process in implanted poly-silicon studied by nanocalorimetry: Effects of heating rate and beam flux
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Ion beam analysis of GaInAsSb films grown by MOVPE on GaSb
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Using accelerator techniques to verify details in SIMS profiles
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Beyond single scattering off flat samples
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A new comprehensive detector for RHIC-II
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Iron distribution in the implanted silicon under the action of high-power pulsed ion and laser beams
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Charging effect during ion beam analysis: Comparison between aluminium and glass substrates
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Complementary use of ERDA and RBS/C for the determination of implanted atom and damage distributions in spinel
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Application of ion beam analysis to the characterization of protective coatings prepared by plasma detonation techniques on steel samples
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Compositional and structural characterisation of GaSb and GaInSb
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The measurement of sputtering yields and spectrum of mass and optical emission of sputtered particles induced by ion bombardment of H2O ice
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Use of the nuclear microprobe for the characterization of ion-implanted spinel
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RBS, ERDA and XPS study of Ag and Cu diffusion in PET and PI polymer foils
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Use of ion beam analysis techniques to characterise iron corrosion under water radiolysis
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Hints on chemical information obtained by ERDA measurements
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Degradation of PET, PEEK and PI induced by irradiation with 150 keV Ar+ and 1.76 MeV He+ ions
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Production of waveguides in LiF by MeV ion bombardment
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Modification of materials by high energy plasma ions
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The large-area time-of-flight upgrade for STAR
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Annealing effects in samples of silicon implanted with helium by plasma immersion ion implantation
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Implant isolation of plasma-assisted MBE grown GaInAsN for opto-telecommunication applications
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Comparison of nitrogen ion beam and plasma immersion implantation in Al5052 alloy
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Chromium enrichment of AISI 304 stainless steel surface after nitrogen ion recoil bombardment of chromium film
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Transfer of thin silicon layers by MeV hydrogen implantation
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Implant isolation of InP by nitrogen irradiation: Effect of dose, initial carrier concentration and implantation temperature
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In situ characterization of phase formation during high-energy oxygen ion implantation in molybdenum
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Compositional transformations in ion implanted polymers
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Application of ion beam analysis for the control of the improvement of the oxidation resistance of TiAl at 900 °C in air by fluorine ion implantation and HF-treatment
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Modification of composition and structure of bimetallic nanocluster in silica by ion beam irradiation
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A new e-beam application in the pharmaceutical industry
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