
Stoichiometric, epitaxial ZrB2 thin films with low oxygen-content deposited by magnetron sputtering from a compound target: Effects of deposition temperature and sputtering power
Keywords: A1 پراش اشعه ایکس; A1. X-ray diffraction; A1. X-ray photoelectron spectroscopy; A3. Physical vapor deposition processes; B1. Borides