Influence of thickness on the crystallography and surface topography of TiN nano-films deposited by reactive DC and pulsed magnetron sputtering

► 50 nm and 500 nm thick TiN films are applied by continuous and pulsed sputtering. ► All the films are polycrystalline and mono-phase. ► 50 nm films have a strong {111} in plane crystallographic texture. ► During growth texture weakens and crystal perfection and surface smoothness increase. ► The surfaces are smoother when the films are applied by pulsed sputtering.