کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10669988 | 1008846 | 2012 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Deposition of nanocrystalline translucent h-BN films by chemical vapor deposition at high temperature
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
h-BN layers were deposited on α-SiC and sapphire substrates by chemical vapor deposition at high temperature (1500-1900 °C) using B2H6 and NH3 diluted in Ar. Growth rates were in the 6-10 μm/h range. In all the conditions studied, the as deposited BN layers were found to be translucent to light, some having a light whitish aspect and other a more yellowish one. It was also observed that the deposit was not always adhesive. Characterizations showed that the layers were nano-crystalline with crystallite size < 10 nm. The growth rate was found to be temperature and N/B ratio dependent due to an N limited growth regime which is more pronounced above 1700 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 520, Issue 7, 31 January 2012, Pages 2424-2428
Journal: Thin Solid Films - Volume 520, Issue 7, 31 January 2012, Pages 2424-2428
نویسندگان
Ghassan Younes, Gabriel Ferro, Maher Soueidan, Arnaud Brioude, Veronique Souliere, François Cauwet,