Strong amorphization of high-entropy AlBCrSiTi nitride film

► Films are deposited from an equimolar AlBCrSiTi target in various argon/nitrogen atmospheres at different substrate temperatures. ► We provide an alternative approach for producing amorphous nitride films with high thermal stability up to 700 oC for 2 h. ► At annealing temperatures of 800 oC and above, the amorphous films transform into a simple NaCl-type face-centered cubic solid solution. ► Even after annealing at 1000 °C for 2 h, the grain size is only 2 nm.