Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

► Thin Ru films can be grown by ALD from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen. ► Growth of Ru is enhanced on Si at low temperatures and on oxides at high temperatures. ► HfO2 is the most favoring substrate for the nucleation of ruthenium.