کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1663863 | 1517995 | 2016 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Deposition of silicon oxide coatings by atmospheric pressure plasma jet for oxygen diffusion barrier applications
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Silicon oxide thin-film coated polymer substrates have great applications in the packaging industry for food and medical products, because these types of treated substrates show excellent barrier properties toward oxygen and moisture diffusion. In this work, silicon oxide coatings were fabricated on polyethylene terephthalate and polyimide (PI) substrates by an atmospheric pressure jet. The deposited coatings have been carefully characterized by Fourier transform infrared spectroscopy, scanning electron microscope and atomic force microscope for chemical structures and morphology. The influence of the hexamethyldisiloxane concentration in feed gas and the distance from plasma nozzle to PI substrate is also carefully investigated. With optimized deposition conditions, the obtained silicon oxide coated PI substrates show a satisfactorily low oxygen transmission rate of 0.7 ml/m2/day (at 25 °C, dry oxygen).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 615, 30 September 2016, Pages 63-68
Journal: Thin Solid Films - Volume 615, 30 September 2016, Pages 63-68
نویسندگان
Haitao Zhang, Zheng Guo, Qiang Chen, Xinwei Wang, Zhengduo Wang, Zhongwei Liu,