کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1663927 1517997 2016 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Properties of nickel films growth by radio frequency magnetron sputtering at elevated substrate temperatures
ترجمه فارسی عنوان
خصوصیات رشد فیلم نیکل توسط اسپکترومغناطیسی رادیویی فرکانس رادیویی در دماهای بالا بستر
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Pure nickel (Ni) thin films of thicknesses of 100 nm were deposited on glass substrates by radio frequency magnetron sputtering at a power of 100 W and at various substrate temperatures i.e., room temperature, 100, 200, and 300 °C. The crystalline structure, surface topography, surface morphology, electrical resistivity, and optical properties of the deposited films were studied. The properties of the Ni films could be controlled by altering the substrate temperature. Specifically, the films featured a face-centered cubic crystalline structure with predominant (111) crystallite orientation at all the substrate temperatures employed, as observed from the X-ray diffraction analysis. Films deposited at substrate temperatures greater than 200 °C additionally displayed crystalline (200) and (220) diffraction peaks. The surface morphology analysis revealed that the grain size of the Ni thin films increased with increasing substrate temperatures employed. This increase was accompanied with a decrease in the resistivity of the Ni films. The surface roughness of the films increased with increasing substrate temperatures employed, as observed from the atomic force microscopy analysis.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 612, 1 August 2016, Pages 82-86
نویسندگان
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