کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1664715 1518018 2015 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Electrochromic study on amorphous tungsten oxide films by sputtering
ترجمه فارسی عنوان
مطالعه الکتروکرومیک بر روی فیلم های اکسید تنگستن آمورف با اسپری شدن
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی


• Amorphous WO3 films are deposited by DC sputtering under different O2 flow rates.
• Higher oxygen flow rate (> 10 sccm) assures the deposition of amorphous WO3 films.
• Both potentiostat and cyclic voltammetry make WO3 films switch its color.
• An optimal electrochromic WO3 is to make films close to its stoichiometry.

Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet–visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10–20 sccm) assures the deposition of amorphous WO3 films. To explore the electrochromic function of deposited WO3 films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO3 films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO3 film with composition close to its stoichiometry is an optimal choice for electrochromic function.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 587, 31 July 2015, Pages 75–82
نویسندگان
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