کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1664736 1518017 2015 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effects of thermal treatment on the anodic growth of tungsten oxide films
ترجمه فارسی عنوان
اثرات درمان حرارتی بر رشد آنودایز از فیلم های اکسید تنگستن
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی


• Porosity of the WO3 reduces as annealing temperature increases above 400 °C.
• As-grown film is amorphous which transforms to monoclinic/orthorhombic upon annealing.
• As-grown film shows better ion intercalation in electrochemical process.
• Optical band gap of WO3 reduces as the annealing temperature increases.
• Film annealed at 400 °C exhibits best photocatalytic performance.

This work reports the investigation of the effects of thermal treatment on anodic growth tungsten oxide (WO3). The increase of the thermal treatment temperature above 400 °C significantly influences WO3 film where high porosity structure reduces to more compact film. As-grown film is amorphous, which transforms to monoclinic/orthorhombic phase upon annealing at 300–600 °C. With the reducing of porous structure, preferential growth of (002) plane shifts to (020) plane at 600 °C with more than twentyfold increase of peak's intensity compared to the film annealed at 500 °C. Films annealed at low thermal treatment show better ion intercalation and reversibility during electrochemical measurements; however, it has larger optical band gap. Photoelectrochemical measurement reveals that film annealed at 400 °C exhibits the best photocatalytic performance among the films annealed at 300–600 °C.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 588, 3 August 2015, Pages 44–49
نویسندگان
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