Pulsed laser deposition of La0.6Ca0.4Fe0.8Ni0.2O3 − δ thin films on SrTiO3: Preparation, characterization and electrical properties

• La0.6Ca0.4Fe0.8Ni0.2O3 − δ thin films were deposited by pulsed laser deposition.
• The effect of oxygen pressure on films properties was studied.
• Small polaron hopping was dominant mechanism in film electrical conductivity.
• Comparing with Si, SrTiO3(l00) substrates are better for electrical properties.
• Electrical and morphological properties were optimum at 40 Pa oxygen pressure.

In this study La0.6Ca0.4Fe0.8Ni0.2O3 − δ (LCFN) thin films are deposited on SrTiO3(l00) (STO(l00)) and Si(100) substrates by pulsed laser deposition at oxygen pressure of 13.3, 26.7, 40 and 53.3 Pa. For LCFN/STO, X-ray diffraction and field emission scanning electron microscopy show film growth along (l00) direction. The electrical resistivity measurements reveal that PO2 = 40 Pa provides an optimum electrical properties with an electrical conductivity as high as 69 Scm− 1 and small polaron activation energy of 0.09 eV. It is attributed to increased films oxygen concentration and enhanced grains intimate contact. Also, by the measurement of electrical conductivity relaxation, chemical surface exchange coefficient of the film deposited at 40 Pa is calculated. Moreover, the effect of substrate type on the films electrical resistance is studied.