کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1665320 1518037 2014 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Cobalt oxide thin film low pressure metal-organic chemical vapor deposition
ترجمه فارسی عنوان
کربن اکسید ورق نازک کم فشار فلز-آلی شیمیایی تخمیر بخار
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی


• Deposition of dense, highly conformal cobalt oxide films
• X-ray photoelectron spectroscopy of unaltered surface due to in-situ approach
• Insights into deposition process

Cobalt oxide thin films were deposited by metal-organic chemical vapor deposition at low pressure using dicarbonyl cyclopentadienyl cobalt (CoCp(CO)2) and oxygen as reactant gas. Depending on substrate temperature and oxygen partial pressure, thin films consist of metallic cobalt, cobalt (II) oxide (CoO) or cobalt (II,III) oxide (Co3O4). The films show excellent conformality on three dimensional surface structures. Films were characterized using photoelectron spectroscopy (XPS), Raman spectroscopy and scanning electron spectroscopy. XPS analysis was performed in-situ after the deposition process, allowing insights into the decomposition process of the precursor.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 567, 30 September 2014, Pages 8–13
نویسندگان
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