A combined sensor for the diagnostics of plasma and film properties in magnetron sputtering processes

A combined sensor for the simultaneous measurement of plasma and deposition parameters has been designed and built. It comprises (i) a quartz crystal microbalance, (ii) a planar Langmuir probe and (iii) a calorimetric (Gardon) probe, which allows to measure the deposition rate, typical plasma parameters (plasma density and electron temperature) and the total energy input into a growing film. The combined sensor is electrically insulated against ground, allowing these measurements also for floating or substrate-bias conditions. These parameters are measured (nearly) simultaneously, controlled by a specific measurement and analysis program. The operation of this combined sensor is demonstrated for the deposition of copper and tungsten films with a 2 inch planar magnetron.

► A combined sensor was developed for the analysis of plasma and deposition parameters.
► It consists of a quartz crystal microbalance, a Langmuir and a calorimetric probe.
► It allows to measure the deposition rate, plasma density and the total energy input.
► It allows a fast analysis of particle and energy fluxes on a growing film.