Large-distance rf- and dc-sputtering of epitaxial La1 − xSrxMnO3 thin films

Studies on large-distance sputtering as an effective alternative to molecular beam epitaxy, pulsed laser deposition or off-axis sputtering for the deposition of epitaxial La1 − xSrxMnO3 (LSMO) thin films, are reported. The focus of this study is on the quality of the samples and their structural and magnetic properties. The dependence of the characteristics of the LSMO films on the sputtering mode (rf, dc) and the sputtering parameters, in particular on the oxygen partial pressure is established and discussed. It is shown that large-distance sputtering can provide high quality LSMO thin films without the need for post-annealing.

► Large-distance sputtering of LSMO is an effective alternative deposition method.
► Epitaxial growth and smooth interfaces without the need for post-annealing.
► Sharp magnetic phase transition with tailorable Curie temperature.
► High influence of oxygen partial pressure in rf-mode, low influence in dc-mode.