کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1667688 | 1008856 | 2011 | 7 صفحه PDF | دانلود رایگان |

TiN/CNx multilayer films with bilayer periods of 4.5–40.3 nm were deposited by direct-current magnetron sputtering. Layer morphology and structure of the multilayered films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy. The TiN/CNx multilayers exhibited coherent epitaxial growth due to the mutual growth-promoting effect at small bilayer period and some crystalline regions going through the interface of TiN/CNx. Nanoindentation tests showed that the hardness of the multilayers varied from 12.5 to 31 GPa, with the highest hardness being obtained with a bilayer period of 4.5 nm. The tribological properties of the films were investigated using a ball-on-disk tribometer in humid air, and the TiN/CNx multilayer with a bilayer period of 4.5 nm also exhibited the lowest friction coefficient and the highest wear resistance.
Journal: Thin Solid Films - Volume 519, Issue 15, 31 May 2011, Pages 4842–4848