کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1667804 | 1008857 | 2011 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Density measurement of thin-films for micro-electromechanical systems using micro-cantilever structures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
The use of micro-cantilever test structures for determining the density of thin film materials is reported. A range of micro-cantilever test structures has been fabricated using silicon, silicon nitride and silicon carbide which are materials that are commonly used in the fabrication of micro-electromechanical systems. The density of each material was determined by combining load–deflection and resonant frequency measurements, and using the Euler–Bernoulli equation for single clamped beams. The density values obtained were 2.35, 3.16 and 3.18 g/cm3 for silicon, silicon carbide and silicon nitride respectively. These values of density for these thin films agree very well with the values quoted in the literature.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 22, 1 September 2011, Pages 7932–7935
Journal: Thin Solid Films - Volume 519, Issue 22, 1 September 2011, Pages 7932–7935
نویسندگان
E.J. Boyd, V. Nock, X. Li, D. Uttamchandani,