کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1668125 1008863 2011 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Surface treatments of indium tin oxide films by using high density plasma
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Surface treatments of indium tin oxide films by using high density plasma
چکیده انگلیسی

We investigated the effects of various surface treatments on the work function and chemical composition of an indium tin oxide (ITO) surface. Ultraviolet photoelectron spectroscopy (UPS) was used to measure the work function of ITO. X-ray photoelectron spectroscopy (XPS) was used to study the electron structures of ITO surface. We performed surface treatments on ITO using O2 plasma and HCl solution. Our UPS/XPS analysis indicates increases in the work functions by O2 plasma treatments. It is known that the Fermi energy level is controlled by the donor concentration, and thus the Fermi energy level is shifted toward the valence band minimum.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 20, 1 August 2011, Pages 6824–6828
نویسندگان
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