Film thickness dependence of microstructures and magnetic properties in single-layered FePt films by in-situ annealing

The FePt films with various thicknesses (t) of 5 to 50 nm are deposited on Si(100) substrate without any underlayer by in-situ annealing at substrate temperature (Ts) of 620 °C. A strong (001) texture of L10 FePt film is obtained and presents high perpendicular magnetic anisotropy as the film thickness increases to 30 nm. By further increasing the thickness to exceed 30 nm, the (111) orientation of L10 FePt is enhanced greatly, indicating that the quality of perpendicular magnetic anisotropy degrades when the thickness of the FePt film is greater than 30 nm. The single-layered FePt film with thickness of 30 nm by in-situ depositing at 620 °C shows good perpendicular magnetic properties (perpendicular coercivity of 1033 kA/m (13 kOe), saturation magnetization of 1.08 webers/m2 and perpendicular squareness of 0.91, respectively), which reveal its significant potential for perpendicular magnetic recording media.