کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1668243 1008864 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Resistive switching characteristics of ytterbium oxide thin film for nonvolatile memory application
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Resistive switching characteristics of ytterbium oxide thin film for nonvolatile memory application
چکیده انگلیسی

This paper studies the effects of both the positive and negative forming processes on the resistive switching characteristics of a Pt/Yb2O3/TiN RRAM device. The polarity of the forming process can determine the transition mechanism, either bipolar or unipolar. Bipolar behavior exists after the positive forming process, while unipolar behavior exists after the negative forming process. Furthermore, the bipolar switching characteristics of the Pt/Yb2O3/TiN device can be affected by using a reverse polarity forming treatment, which not only reduces the set and reset voltage, but also improves the on/off ratio.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 520, Issue 5, 30 December 2011, Pages 1656–1659
نویسندگان
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