کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1668699 | 1008874 | 2010 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Ellipsometry and transmission electron microscopy study of MoSi2 coatings after oxidation at high temperature in air
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
MoSi2 coatings were deposited on Si (100) substrates by means of magnetron sputtering. The structural and optical properties of the coatings were then investigated through transmission electron microscopy (TEM) and UV-visible-near IR ellipsometry after heat treatments in air at two temperatures (1100Â K and 1600Â K). After annealing at 1100Â K, no silica layer could be observed by TEM at the surface of the MoSi2 coating, whereas annealing at 1600Â K gave rise to a protective silica layer. As observed by TEM, this silica layer contained nanometric molybdenum silicide crystals. Increasing the annealing time at 1600Â K from 20Â min to 2Â h resulted in both a higher concentration and growth of these molybdenum silicide crystals in the silica layer. An optical model, taking into account the observed microstructure and allowing a good fit of the ellipsometry data, was developed. It is also shown that the dielectric constants of the non-oxidized part of the MoSi2 layer became modified when the annealing temperature (1100Â K versus 1600Â K) and the annealing time at 1600Â K (20Â min versus 2Â h) were increased.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 2, 1 November 2010, Pages 605-613
Journal: Thin Solid Films - Volume 519, Issue 2, 1 November 2010, Pages 605-613
نویسندگان
E. Bruneton, S. Martoia, S. Schelz,