کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1669148 1008879 2010 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Deposited dielectrics on metal thin films using silicon and glass substrates for hot electron-induced electrochemiluminescence
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Deposited dielectrics on metal thin films using silicon and glass substrates for hot electron-induced electrochemiluminescence
چکیده انگلیسی

Electrochemiluminescence by tunnel emission of hot electrons into aqueous solution is a sensitive method for detection of luminophores e.g. rare-earth chelates, which may be used as labels in bioassays. Electrons are injected into solution from an insulating film-coated working electrode, working against a platinum counter electrode. Conductive silicon electrodes with various tunnel dielectric materials e.g. thermal oxide have been used in previous work. In this paper we explore the use of metal thin film electrodes on silicon and glass substrates, using tunneling dielectrics of aluminum oxide and silicon dioxide made by the low-temperature processes of atomic layer deposition or plasma-enhanced chemical vapor deposition.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 519, Issue 1, 29 October 2010, Pages 430–433
نویسندگان
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